Open Access Journal

ISSN : 2394 - 6849 (Online)

International Journal of Engineering Research in Electronics and Communication Engineering(IJERECE)

Monthly Journal for Electronics and Communication Engineering

Open Access Journal

International Journal of Engineering Research in Electronics and Communication Engineering(IJERECE)

Monthly Journal for Electronics and Communication Engineering

ISSN : 2394-6849 (Online)

SRAM Architecture with A Full-Swing Local Bitline By Using Cross-Coupled pMOSs

Author : Z Dorababu 1 S Narasimhulu 2

Date of Publication :12th September 2017

Abstract: In the previous average-8T static random access memory has a competitive area and does not require a write-back scheme. In the case of average 8T SRAM architecture, a full-swing local bitline, that can be achieved with a boosted wordline voltage. In this average 8T SRAM Architecture, such as a 22-nm FinFET technology used, where the variation in threshold voltage is large, because of this reason read stability of SRAM degraded. Thus, a full-swing local BL cannot be achieved, resulting in a considerably large read delay and it can store only four bits in one block. To overcome the above disadvantages, in this paper and proposed SRAM architecture with a full swing local BL is proposed. In the proposed SRAM architecture, full swing of the local BL is ensured by the use of cross-coupled pMOSs, and the gate of the read buffer is driven by a full VDD, without the need for the boosted WL voltage. The proposed SRAM architecture that stores 16 bits in one block with achieves with 0.8v minimum voltage and read delay is lesser than that of average 8T SRAM architecture.

Reference :

  1. [1]. Kyoman Kang, Hanwool Jeong “Full-Swing Local Bitline SRAM Architecture Based on the 22nm FinFET Technology for Low-Voltage Operation,” IEEE J. Solid-State Circuits, vol. 43, no. 4, April. 2016.

    [2]. L. Changet al., “An 8T-SRAM for variability tolerance and low-voltage operation in high-performance caches,” IEEE J. Solid-State Circuits, vol. 43, no. 4, pp. 956–963, Apr. 2008.

    [3]. N. Verma and A. P. Chandrakasan, “A 256 kb 65 nm 8T sub threshold SRAM employing sense-amplifier redundancy,” IEEE J. Solid-State Circuits, vol. 43, no. 1, pp. 141–149, Jan. 2008.

    4]. T.-H. Kim, J. Liu, J. Keane, and C. H. Kim, “A 0.2 V, 480 kb subthreshold SRAM with 1 k cells per bitline for ultra-low voltage computing,” IEEE J. Solid-State Circuits, vol. 43, no. 2, pp. 518–529, Feb. 2008.

    [5]. B. H. Calhoun and A. P. Chandrakasan, “A 256-kb 65-nm sub-threshold SRAM design for ultra-low-voltage operation,” IEEE J. Solid-State Circuits, vol. 42, no. 3, pp. 680–688, Mar. 2007.

    [6]. Q. Li, B. Wang, and T. T. Kim, “A 5.61 pJ, 16 kb 9T SRAM with single-ended equalized bitlines and fast local write-back for cell stability improvement,” in Proc. Eur. SolidState Device Res. Conf., Sep. 2012, pp. 201–204.

    [7]. J. Maiz, S. Hareland, K. Zhang, and P. Armstrong, “Characterization of multi-bit soft error events in advanced SRAMs,” in IEDM Tech. Dig., Dec. 2003, pp. 21.4.1–21.4.4.

    [8]. J. Chang, J.-J. Kim, S. P. Park, and K. Roy, “A 32 kb 10T sub-threshold SRAM array with bit-interleaving and differential read scheme in 90 nm CMOS,”IEEE J. Solid-State Circuits, vol. 44, no. 2, pp. 650–658, Feb. 2009.

    [9]. BSIM-CMG 107.0.0 Multi-Gate MOSFET Compact Model. (July. 2013)

    [10]. C. Auth et al., “A 22 nm high performance and lowpower CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors,” in Proc. Symp. VLSI Technol., Jun. 2012, pp. 131–132.


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